The University of Chicago Alumni Career Services and the Alumni Club of Dallas/Ft.Worth invite you to join us for our 5th Annual Dallas/Ft. Worth career-focused panel discussion: "Climbing the Corporate Ladder"
Free for alumni
$10 for nonalumni who preregister
$20 for nonalumni at the door
Sam Deshpande (Panelist)
Chief Risk Officer, Capital One
Sam is currently the Senior Vice President of Capital One and the Chief Risk Officer, and head of Enterprise Services for Capital One's Financial Services division.
Prior to this Sam held various leadership positions at Capital One including, Head of Credit and Business Strategy for Mortgage division, Head of Credit and Strategy for Auto Finance, Head of Direct to Consumer business, and Marketing and Analysis. Sam was also previously a management consultant with Accenture and Booz & Co.
He has an MBA in from the University of Chicago Booth School of Business and a BA in Technology from the Indian Institute of Technology.
Patrick Boyce (Panelist)
Head of Private Equity, Highland Capital Management
Mr. Boyce is a Partner and the Head of the Private Equity team at Highland Capital Management, L.P. Mr. Boyce began his career at Highland as a Distressed Portfolio Manager having joined Highland in March 2004. Prior to joining Highland, he was a Vice President in the Investment Banking group of Citigroup from 2000 to 2004. Prior to joining Citigroup, Mr. Boyce was an Investment Banking professional for Donaldson, Lufkin & Jenrette where he had corporate finance responsibilities in both the Los Angeles and Dallas offices.
He has an MBA in Finance and Accounting from the University of Chicago Booth School of Business and a BBA in Finance from Baylor University where he was a Teagle Scholar and on the NCAA golf team.
Archan Tikoti, '09
Career Chair, Alumni Club of DFW
Please join us for a discussion, featuring two distinguished alumni, about how they navigated various challenges and choices in their careers and ask them for tips or ideas on how to handle career decisions in your work environment.